BR VacuumOur main products include vacuum accessories, vacuum valves, non-standard vacuum customization, vacuum pumps, vacuum measurement, vacuum accessories, mass flow meters, and vacuum technology
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Avacuumis a space where the pressure is lower than the standard atmospheric pressure (101.325 kPa or 101 kPa), meaning it contains fewer gas molecules than the surrounding atmosphere.Thevacuum level(or degree of vacuum) measures how much lower the pressure is compared to atmospheric pressure. It is defined as:Vacuum Level = Atmospheric Pressure – Absolute PressureThis value is always positive and indicates how close the space is to a perfect vacuum. For example, a vacuum of “-75 kPa” or “90% vacuum” means the pressure inside is 75 kPa below atmospheric pressure or 10% of atmospheric pressure remaining, respectively.
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In vacuum systems, the simple equationQ = P × Sis used to explain almost every design challenge. Gas load (Q), pressure (P), and pumping speed (S) are the three variables whose balance determines how well a vacuum system performs.1. How to Reach a Lower Pressure (P)?Reaching a lower pressure is often the hardest part of vacuum work. Once you understand that pressure depends on the balance between the system’s gas load (Q) and the available pumping speed (S), the task becomes clearer.Below are the key concepts in more detail.2. Understanding Pressure (P)Pressure (P) is the force per unit area exerted by gas molecules colliding with a surface.To reduce pressure (P):Increase pumping speed (S), and/orDecrease gas load (Q).3. Understanding Pumping Speed (S)Pumping speed (S) is the volumetric rate at which a pump removes gas from the chamber.To reduce pressure (P):Increase pumping speed (S), and/orUse larger-diameter and/or shorter lines between pump and chamber.4. Understanding Gas Load (Q)
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Introduction to VacuumVacuum refers to a space devoid of any matter or with extremely thin gas, typically defined as a state where the pressure is below one standard atmosphere (101325 Pa). It plays a pivotal role in semiconductor manufacturing by providing environments essential for various processes.Applications of Vacuum in Semiconductor EquipmentWafer/Reticle Handling: Utilizes vacuum to securely hold wafers and reticles during processing.Creating Reaction Conditions: Vacuum conditions are crucial for reducing impurities and ensuring high purity and structural integrity of materials used in semiconductor devices.Specific Applications:Crystal Growth Equipment: For instance, in the production of single-crystal silicon using the Czochralski method, a low-oxygen vacuum environment minimizes impurity incorporation, enhancing crystal quality.Compound Semiconductor Growth: Precise control over stoichiometry during growth under vacuum ensures optimal electrical performance of compound semi
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Over the past two decades, vacuum-sealed packaging has rapidly advanced as a key method for food preservation. This technique effectively removes oxygen, preventing spoilage and extending shelf life. Additionally, vacuum packaging—whether in shrink-wrap or modified-atmosphere forms—safeguards food from insect damage and inhibits mold growth. Its advantages include simple, user-friendly equipment, low operational costs, and affordable plastic materials that are both visually appealing and widely accessible. Common vacuum-packaged products range from pickled vegetables (e.g., mustard tubers, kohlrabi, kelp) to meats (sausages, roast chicken, duck), soy products, milk powder, and malted beverages.The fresh produce supply chain often suffers significant losses due to prolonged intermediary stages between harvest and retail, driving up prices. Vacuum packaging mitigates this by reducing spoilage and refrigeration costs, thus stabilizing prices and easing supply-demand imbalances. As a resul
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1. Boyle's Law: When the temperature remains constant, the relationship between gas pressure P and volume V is P · V=constant, that is, P1/P2=V2/V1.2. Gay Lussac's law: When the pressure P is constant, the volume V of the gas is proportional to the absolute temperature T, such as V1/V2=T1/T2=constant. For every 1 ℃ increase (or decrease), the volume changes by 1/273 times.3. Charlie's Law: In the case of a constant volume V, the gas pressure P is proportional to T, that is, P1/P2=T1/T2. A temperature change of 1 ℃ results in a corresponding increase or decrease of 1/273 in pressure.4. Average free path: λ=5 × 10-3/P (cm) describes the average free path of gas molecules.5. Pumping speed calculation: S=dv/dt (liters/second) or S=Q/P, where Q is flow rate, P is pressure, V is volume, and t is time.6. Conductivity formula: C=Q/(P2-P1) (liters/second) represents the ability of fluid to pass through a pipeline.7. Vacuum pumping time: t=8V/S, empirical formula, used to estimate the pumping ti
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In engineering and technical contexts, a space is considered under vacuum as soon as its absolute pressure is below standard atmospheric pressure (101 325 Pa or 1 atm).
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