BR VacuumOur main products include vacuum accessories, vacuum valves, non-standard vacuum customization, vacuum pumps, vacuum measurement, vacuum accessories, mass flow meters, and vacuum technology
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In the realm of vacuum science, vacuum refers to a gas state within a given space that is below one atmospheric pressure. This rarefied gas state is commonly referred to as a vacuum condition. Compared to the atmospheric conditions essential for human survival, this specific vacuum state has several fundamental characteristics:Pressure Differential: In a vacuum state, the gas pressure is lower than one atmospheric pressure. Consequently, all vacuum containers on the Earth's surface are subjected to atmospheric pressure, with the magnitude of this force determined by the pressure difference between the interior and exterior of the container. Given that one atmospheric pressure on the Earth's surface is approximately 10135 N/m², if the internal pressure of a container is very low, it will experience an external pressure close to one atmospheric pressure. The force per unit area at different pressures is illustrated in Table 1.Gas Molecular Density: Due to the thinness of gases in a vacuu
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The concept of ultimate vacuum is critical in various fields where extremely low-pressure environments are necessary. Here are several examples showcasing its practical applications:Scientific Research:Particle Physics Research: Facilities like the Large Hadron Collider (LHC) rely on ultra-high vacuum (UHV) conditions, achieving ultimate vacuums down to 10^-9 to 10^-10 Pascals. This ensures that particle beams can travel long distances with minimal collision against gas molecules.Material Science and Surface Analysis: Techniques such as Scanning Tunneling Microscopy (STM) and Atomic Force Microscopy (AFM) require an exceptionally clean environment free from air-borne contaminants, necessitating high or ultra-high vacuum conditions.Semiconductor Manufacturing:In the fabrication of semiconductor chips, processes including Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), and etching are conducted under high vacuum or UHV to minimize contamination and ensure precision. The
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The ultimate vacuum refers to the lowest pressure or the highest level of vacuum that a vacuum system can achieve. In other words, it is an indicator of the capability of a vacuum pump or other vacuum generation equipment, representing the best vacuum condition that the system can attain under ideal circumstances. Different vacuum pump technologies have different ranges of ultimate vacuum. For instance, the ultimate vacuum of mechanical pumps is typically between 10^-3 to 10^-4 Pascals, whereas high-performance pumps such as diffusion pumps and turbomolecular pumps can reach pressures down to 10^-7 Pascals or even lower. The ultimate vacuum is one of the critical parameters for evaluating the performance of a vacuum system, playing a significant role in both scientific research and industrial applications.
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Vacuum technology plays a pivotal role in various equipment designed for transport, attraction, lifting, and vacuum molding by leveraging the pressure differential between a vacuum and atmospheric pressure to perform work. This mechanical energy, characterized by uniform pressure distribution, can be applied seamlessly across any shape or plane. The versatility of these vacuum devices finds extensive application in industries ranging from food processing (such as fish, grain, flour, coal powder) to construction materials (cement, precast slabs), environmental cleanup (suctioning radioactive dust after atomic explosions), medical procedures (like fetal aspiration during abortions), and more. These applications are marked by their simplicity, ease of operation and maintenance, vibration-free performance, high efficiency, safety in handling delicate items, and environmentally friendly nature.Vacuum Transport, Attraction, and Lifting EquipmentIn sectors like agriculture, manufacturing, and
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Creating a vacuum—removing gas from a container or system to reduce internal pressure—is a critical step in numerous scientific experiments, industrial processes, and technological applications. The main reasons include:Preventing Oxidation and Contamination: In air, oxygen, water vapor, and other impurities can react with materials (especially metals or reactive substances at high temperatures), causing oxidation or contamination. A vacuum environment effectively suppresses these reactions, preserving material purity and performance. This is essential in metal refining, semiconductor manufacturing, and thin-film deposition.Reducing Molecular Collisions: In high or ultra-high vacuum, the number of gas molecules is extremely low, drastically reducing collision frequency. This is vital for applications like particle accelerators, electron beam welding, and mass spectrometry, where particles or electron beams must travel long distances without interference.Improving Thermal Insulati
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Ultra-High Vacuum (UHV) refers to an extremely low-pressure environment, typically below 1×10^-7 Pascals and can reach down to less than 1×10^-10 Pascals. In such conditions, only a very small number of molecules exist per cubic centimeter, making UHV crucial for various scientific research and technological applications. Here are some key applications of UHV:Surface Science: Experiments conducted under UHV greatly reduce the risk of surface contamination and oxidation since there are virtually no residual gas molecules to react with the sample surfaces. This makes UHV ideal for studying the physical and chemical properties of material surfaces, including adsorption, desorption processes, and catalysis.Thin Film Growth Technologies: Techniques like Molecular Beam Epitaxy (MBE) and Atomic Layer Deposition (ALD) require extremely pure environments to ensure the quality and uniformity of the thin films produced. UHV conditions prevent the introduction of impurities, thus guaranteeing the
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